Titanium Alloy Sputtering Target
Product Details
Product Description
Titanium targets are processed from high-purity titanium materials. It has a glossy silver-white appearance, its melting point is 1660°C, its boiling point is 3287°C, and its density is 4.5g/cm3. Titanium targets have the characteristics of high purity, high density, high strength and corrosion resistance. High-performance titanium sputtering targets are an important measure to achieve independent research and development of key materials for the electronic information manufacturing industry and to promote the transformation and upgrading of the titanium industry to high-end.
Characteristics of titanium target material
Titanium target shape: flat target, rotating target special-shaped customization
Titanium target purity: 2N7, 4N, 4N5, 5N
Titanium target size: processed according to drawings or customized by others
We can also provide titanium wire, titanium grains, titanium flakes, titanium powder, etc.
Titanium target preparation process
Select titanium raw material (4N or 5N), use vacuum melting method to melt the titanium raw material, and cast the molten soup. After casting, the molten soup is cooled to form an ingot blank;
The ingot billet is subjected to the first heat treatment. The temperature of the first heat treatment is 450~650℃, and the holding time is 0.5~2.5h. Then the ingot billet after the heat preservation heat treatment is hot rolled or air hammer forged to form the first titanium blank;
The first titanium billet is subjected to a second heat treatment. The temperature of the second heat treatment is 350°C to 550°C, and the holding time is 1 to 3 hours. Then, the first titanium billet after the holding heat treatment is hot rolled or air hammer forged to form the third titanium billet. Titanium dicarbon;
After the second titanium billet is cooled to room temperature, the second titanium billet is cold-rolled in a room temperature environment to form a cold-rolled billet;
The cold-rolled billet formed by cold rolling is subjected to annealing heat treatment. The annealing heat treatment temperature is 300-700°C and the time is 1-5 hours. A titanium target blank with fine and uniform grains is obtained, and then the titanium target material is obtained through machine tool processing.
This preparation method uses multiple heat treatments to cause solid-state diffusion of elements in the titanium blank to reduce the uneven distribution of chemical components, reduce the delamination of the target blank, and reduce the grain size; at the same time, it can eliminate residual stress and stabilize the size. , reduce hardness and brittleness, increase its plasticity, and reduce deformation and cracking tendencies. The picture below is a typical micrometallographic examination picture of a titanium sputtering target. The average particle size is <100um.
Titanium target application
Titanium target is an important material, mainly used to manufacture materials in high-tech fields such as semiconductors, optoelectronics and magnetic materials. In the semiconductor industry, titanium targets can be used in the manufacture of electronic components, such as photodiodes, phototransistors, photoreceivers and emitters, etc. In the field of optoelectronics, titanium targets can be used to manufacture optoelectronic devices, such as LEDs and solar cells. In the field of magnetic materials, titanium targets can be used to manufacture hard drives and magnetic cards.
In addition to the above applications, titanium targets are also widely used in fields such as high-temperature alloys, conductive materials, chemical catalysts, and medical equipment. These fields not only require high-strength, corrosion-resistant materials, but also stable chemical properties and biocompatibility. Titanium targets just meet these requirements and have become one of the important materials in these fields.
Other applications of titanium
Application of titanium in military industry
Titanium has very broad uses in the military industry. Titanium is widely used in nuclear-powered submarines, hydrofoils, mortar barrels, anti-tank missiles, missile launchers, tank protective panels, bulletproof vests, etc.
Applications of titanium in aerospace
Titanium is widely used in the aviation industry. The amount of titanium used in civil aircraft accounts for about 20 to 25% of the weight of the structure. In addition, titanium is also used in large quantities in strategic rocket engines, spacecraft (such as Shenzhou 5 and Shenzhou 6), and artificial satellite antennas.
Application of titanium in marine industry
In seawater, titanium has corrosion resistance that is unmatched by other metal materials, especially against the high-speed erosion and corrosion of seawater.
Applications in the automotive industry
The light weight, high strength and other properties of titanium have long been paid attention to by automobile manufacturers. Titanium has been used in racing cars for many years. Currently, almost all racing cars use titanium materials.
Application in medicine
With the improvement of medical technology, implanting metal into the human body is a very common surgical operation. Because titanium metal has a weak rejection reaction with human tissue, it is currently widely used in human implants such as artificial bones, artificial joints, and artificial teeth. Be widely used. In addition, the application of titanium in pharmaceutical machinery and medical devices has also been further recognized, and future demand cannot be underestimated.
Application in nuclear industry
In addition to the above uses, titanium is an indispensable and important material for the development of the nuclear industry. Many equipment, pipes and related components used in nuclear reactors, in addition to zirconium and hafnium, also require a large amount of titanium and titanium-based alloy materials. .
Titanium target alloy type
In addition to titanium targets, we can also provide titanium-aluminum alloys, titanium-niobium alloys, copper-titanium alloys, tungsten-titanium alloys, nickel-titanium alloys, vanadium-titanium alloys, molybdenum-titanium alloys and other sputtering targets.
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