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To: Annie Fu

99.99% high purity tantalum rotating sputtering target

Product description

Products Description

Product Name Purity Density Surface Condition Thermal Treatment
Ta Planar Target 3N5 16.65g/cm3 Ground Annealing
Ta Rotary Target 3N5 16.65g/cm3 Ground Annealing
Parameters Typical Value
Composition Ta
Purity ≥99.99%
Boiling point 5731k (5458 ° C)
Melting point 3290k (3017 ° C)
Size customized
Electrical resistivity <2×10-4 Ω·cm


Dimension(mm)
Maximal OD Maximal Length Maximal single segment length Bonding ratio
145-150 3000 250 ≥95%



Product application
 Application
1.Metallizing, Electron-beam Spraying ,sinteting annealing in reducing atmosphere in electronics.
2. Military and light industries
3.Evaporate small lengths of wire or to evaporate materials. 
3.Tantalum boat is ideal for use in small evaporation systems.
4.Tantalum boats sources are used for the vacuum evaporation of materials.


Application
Tantalum is widely used in aviation and aerospace industry, high temperature technology, atomic energy industry and chemical industry thanks to its high melting point, corrosion resistance and good cold working performance.

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