99.99% high purity tantalum rotating sputtering target
Keywords:
Keywords:
Products Description
Product Name | Purity | Density | Surface Condition | Thermal Treatment |
Ta Planar Target | 3N5 | 16.65g/cm3 | Ground | Annealing |
Ta Rotary Target | 3N5 | 16.65g/cm3 | Ground | Annealing |
Parameters | Typical Value |
Composition | Ta |
Purity | ≥99.99% |
Boiling point | 5731k (5458 ° C) |
Melting point | 3290k (3017 ° C) |
Size | customized |
Electrical resistivity | <2×10-4 Ω·cm |
Dimension(mm) | |||
Maximal OD | Maximal Length | Maximal single segment length | Bonding ratio |
145-150 | 3000 | 250 | ≥95% |
Application
Tantalum is widely used in aviation and aerospace industry, high temperature technology, atomic energy industry and chemical industry thanks to its high melting point, corrosion resistance and good cold working performance.